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• May 25, 2005

  IBM, Chartered Select Synopsys' Hi-Speed USB 2.0 and OTG PHYs for Their 90-nm Process Platform

  Synopsys DesignWare® PHY IP Enables Reliable USB Connectivity for IBM and Chartered Foundry Customers
• May 25, 2005

  Synopsys Provides Low-Power Reference Flow for IBM-Chartered 90-Nanometer Process Platform

  Complete RTL to Production-Ready GDSII Flow Speeds 90-nm Designs
• May 24, 2005

  Synopsys i-Virtual Stepper System for Photomask Qualification Implemented by UMC

  i-Virtual Stepper System Integrates Lithography Simulation and Automation to Deliver Improved Mask Turn-Around Time and Yield
• May 23, 2005

  Synopsys Unveils Latest Innovation in RTL Synthesis, Eliminating Wireload Models

  Design Compiler® 2005 Delivers Accurate Correlation to Post-Layout Timing for RTL Designers
• May 18, 2005

  Synopsys Announces CFO Transition

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